Electronic device and method of manufacturing the same

ABSTRACT

The present disclosure relates to an electronic device and a method of manufacturing a filtering component of the electronic device. The electronic device includes a semiconductor component, an insulating layer, at least one contact plug, and a filtering component. The insulating layer is disposed on the semiconductor component. The contact plug penetrates through the insulating layer. The filtering component is disposed on the insulating layer and the contact plug. The filtering component includes a bottom electrode, an isolation layer, a top electrode, and a dielectric layer. The bottom electrode is divided into a first segment connected to the contact plug and a second segment separated from the first segment. The isolation layer is disposed on the bottom electrode, the top electrode is disposed in the isolation layer, and the dielectric layer is disposed between the bottom electrode and the top electrode.

PRIORITY CLAIM AND CROSS-REFERENCE

This application claims the priority benefit of U.S. provisionalapplication Ser. No. 62/773,506, filed on Nov. 30, 2018. The entirety ofthe above-mentioned patent application is hereby incorporated byreference herein and made a part of this specification.

TECHNICAL FIELD

The present disclosure relates to an electronic device and a method ofmanufacturing the same, and more particularly, to an electronic devicewith an integral filtering component and a method of manufacturing theelectronic device.

DISCUSSION OF THE BACKGROUND

An integrated circuit device using semiconductor devices may befabricated by integrating various individual circuit devices, e.g., anelectric field effect transistor, a resistor, a capacitor, etc., intoone chip. Generally, such individual devices have been continuouslyscaled down to provide enhanced performance in relation to operatingspeed and/or power consumption. For example, in dynamic random accessmemory (DRAM), demands for improving the operating speed and powerconsumption have resulted in increased integration of DRAM devices.

However, if a clock frequency of a semiconductor device is increased forfaster operating speed, noise may also increase. In a DRAM, when theoperating speed is increased, noise may increase; and thus the operatingspeed may decrease.

This Discussion of the Background section is provided for backgroundinformation only. The statements in this Discussion of the Backgroundare not an admission that the subject matter disclosed in thisDiscussion of the Background section constitute prior art to the presentdisclosure, and no part of this Discussion of the Background section maybe used as an admission that any part of this application, includingthis Discussion of the Background section, constitutes prior art to thepresent disclosure.

SUMMARY

One aspect of the present disclosure provides an electronic device. Theelectronic device includes a semiconductor component, an insulatinglayer, at least one contact plug, and a filtering component. Theinsulating layer is disposed on the semiconductor component. The contactplug penetrates through the insulating layer. The filtering component isdisposed on the insulating layer and the contact plug. The filteringcomponent includes a bottom electrode, an isolation layer, a topelectrode, and a dielectric layer. The bottom electrode is divided intoa first segment connected to the contact plug and a second segmentseparated from the first segment. The isolation layer is disposed on thebottom electrode, the top electrode is disposed in the isolation layer,and the dielectric layer is disposed between the bottom electrode andthe top electrode.

In some embodiments, the isolation layer is further disposed in a gapbetween the first segment and the second segment.

In some embodiments, a lower surface of the bottom electrode is coplanarwith a bottom surface of the isolation layer opposite to a top surfaceof the isolation layer.

In some embodiments, the dielectric layer extends along the top surfaceof the isolation layer and encircles the top electrode disposed in theisolation layer.

In some embodiments, the top electrode is further disposed over the topsurface.

In some embodiments, the first segment is surrounded by the secondsegment.

In some embodiments, a footprint of the first segment is smaller thanthat of the second segment.

Another aspect of the present disclosure provides an electronic device.The electronic device includes a semiconductor component, an insulatinglayer, at least one contact plug, and a filtering component. Theinsulating layer is disposed on the semiconductor component. The contactplug penetrates through the insulating layer. The filtering component isdisposed on the insulating layer and the contact plug. The filteringcomponent includes a blanket bottom electrode, an isolation layer, adielectric layer, and a top electrode. The blanket bottom electrode isdisposed on the insulating layer and the contact plug, and the blanketbottom electrode is connected to the contact plug. The isolation layeris disposed on the blanket bottom electrode. The top electrode extendsalong a top surface of the isolation layer and is disposed within theisolation layer, the top electrode includes a first segment and a secondsegment separated from each other. The dielectric layer is disposedbetween the top electrode and the isolation layer.

In some embodiments, a gap is disposed between the first segment and thesecond segment, and the dielectric layer is exposed through the gap.

In some embodiments, portions of the dielectric layer are exposed to agap between the first segment and the second segment.

Another aspect of the present disclosure provides a method ofmanufacturing an electronic device. The method includes steps ofproviding a blanket bottom electrode; patterning the blanket bottomelectrode to form a first segment and a second segment separated fromeach other; depositing an isolation layer on the first segment, on thesecond segment, and over a gap between the first segment and the secondsegment; providing a first photoresist layer on the isolation layer;exposing the first photoresist layer to form a first photoresist patternhaving a plurality of first exposed portions and a plurality of firstunexposed portions; providing a second photoresist layer on the firstphotoresist pattern; exposing the second photoresist layer to form asecond photoresist pattern having a plurality of second exposed portionsand a plurality of second unexposed portions; performing an etchingprocess to form a plurality of trenches at intersections wherein thefirst exposed portions and the second exposed portions intersect;depositing a dielectric layer on the isolation layer and in thetrenches; and depositing a top electrode on the dielectric layer.

In some embodiments, the second unexposed portions are disposed over thegap.

In some embodiments, the first exposed portions and the first unexposedportions are alternatingly arranged along a first direction, and thesecond exposed portions and the second unexposed portions arealternatingly arranged along a second direction perpendicular to thefirst direction.

In some embodiments, the method further includes a step of removing thefirst unexposed portions and the second unexposed portions before thedeposition of the dielectric layer.

In some embodiments, the method further includes steps of providingsemiconductor component; depositing an insulating layer on thesemiconductor component; and forming at least one contact plug in theinsulating layer before the providing of the blanket bottom electrode.

In some embodiments, the first segment is in contact with the contactplug.

In some embodiments, the dielectric layer is a conformal layer.

Another aspect of the present disclosure provides a method ofmanufacturing an electronic device. The method includes steps ofproviding a blanket bottom electrode; depositing an isolation layer onthe blanket bottom electrode; coating a first photoresist layer on theisolation layer; exposing the first photoresist layer to form a firstphotoresist pattern having a plurality of first exposed portions and aplurality of first unexposed portions; coating a second photoresistlayer on the first photoresist pattern; exposing the second photoresistlayer to form a second photoresist pattern having a plurality of secondexposed portions and a plurality of second unexposed portions;performing an etching process to form a plurality of trenches atintersections wherein the first exposed portions and the second exposedportions intersect; depositing a dielectric layer on the isolation layerand in the trenches; depositing a top electrode on the dielectric layer;and patterning the top electrode to form a first segment and a secondsegment separated from each other.

In some embodiments, the first exposed portions and the first unexposedportions are alternatingly arranged along a first direction, and thesecond exposed portions and the second unexposed portions arealternatingly arranged along a second direction perpendicular to thefirst direction.

In some embodiments, the method further includes a step of removing thefirst unexposed portions and the second unexposed portions before thedeposition of the dielectric layer.

In some embodiments, the dielectric layer is a conformal layer.

In some embodiments, the method further includes steps of providingsemiconductor component; depositing an insulating layer on thesemiconductor component; and forming at least one contact plug in theinsulating layer before the providing of the blanket bottom electrode.

With the above-mentioned configurations of the electronic device, thefiltering components include at least one decoupling capacitorfunctioning as a noise filter and at least one dummy capacitorfunctioning as a reinforced structure; thus, noise can be effectivelyreduced and operation speed of the electronic device can be improved.

The foregoing has outlined rather broadly the features and technicaladvantages of the present disclosure in order that the detaileddescription of the disclosure that follows may be better understood.Additional features and technical advantages of the disclosure aredescribed hereinafter, and form the subject of the claims of thedisclosure. It should be appreciated by those skilled in the art thatthe concepts and specific embodiments disclosed may be utilized as abasis for modifying or designing other structures, or processes, forcarrying out the purposes of the present disclosure. It should also berealized by those skilled in the art that such equivalent constructionsdo not depart from the spirit or scope of the disclosure as set forth inthe appended claims.

BRIEF DESCRIPTION OF THE DRAWINGS

A more complete understanding of the present disclosure may be derivedby referring to the detailed description and claims. The disclosureshould also be understood to be coupled to the figures' referencenumbers, which refer to similar elements throughout the description.

FIG. 1 is a top view of an electronic device in accordance with someembodiments of the present disclosure.

FIG. 2 is a cross-sectional view taken along the line I-I illustrated inFIG. 1.

FIG. 3 is a cross-sectional view taken along the line II-II illustratedin FIG. 1.

FIG. 4 is a flow diagram illustrating a method of manufacturing anelectronic device in accordance with some embodiments of the presentdisclosure.

FIG. 5 is a cross-sectional view of an intermediate stage in themanufacture of the electronic device in accordance with some embodimentsof the present disclosure.

FIG. 6 is a top view of an intermediate stage in the manufacture of theelectronic device in accordance with some embodiments of the presentdisclosure.

FIG. 7 is a cross-sectional view taken along the line illustrated inFIG. 6.

FIGS. 8 and 9 are cross-sectional views of intermediate stages in themanufacture of the electronic device in accordance with some embodimentsof the present disclosure.

FIG. 10 is a top view of an intermediate stage in the manufacture of theelectronic device in accordance with some embodiments of the presentdisclosure.

FIG. 11 is a cross-sectional view taken along the line IV-IV illustratedin FIG. 10.

FIG. 12 is a cross-sectional view of an intermediate stage in themanufacture of the electronic device in accordance with some embodimentsof the present disclosure.

FIG. 13 is a top view of an intermediate stage in the manufacture of theelectronic device in accordance with some embodiments of the presentdisclosure.

FIG. 14 is a cross-sectional view taken along the line V-V illustratedin FIG. 13.

FIG. 15 is a top view of an intermediate stage in the manufacture of theelectronic device in accordance with some embodiments of the presentdisclosure.

FIG. 16 is a cross-sectional view taken along the line VI-VI illustratedin FIG. 15.

FIG. 17 is a cross-sectional view taken along the line VII-VIIillustrated in FIG. 15.

FIGS. 18 through 20 are cross-sectional views of intermediate stages inthe manufacture of the electronic device in accordance with someembodiments of the present disclosure.

FIG. 21 is a top view of an electronic device in accordance with someembodiments of the present disclosure.

FIG. 22 is a cross-sectional view taken along the line VIII-VIIIillustrated in FIG. 21.

FIG. 23 is a cross-sectional view taken along the line IX-IX illustratedin FIG. 21.

FIG. 24 is a flow diagram illustrating a method of manufacturing anelectronic device in accordance with some embodiments of the presentdisclosure.

FIG. 25 is a cross-sectional view of an intermediate stage in themanufacture of the electronic device in accordance with some embodimentsof the present disclosure.

FIG. 26 is a top view of an intermediate stage in the manufacture of theelectronic device in accordance with some embodiments of the presentdisclosure.

FIG. 27 is a cross-sectional view taken along the line X-X illustratedin FIG. 26.

FIG. 28 is a cross-sectional view of an intermediate stage in themanufacture of the electronic device in accordance with some embodimentsof the present disclosure.

FIG. 29 is a top view of an intermediate stage in the manufacture of theelectronic device in accordance with some embodiments of the presentdisclosure.

FIG. 30 is a cross-sectional view taken along the line XI-XI illustratedin FIG. 29.

FIG. 31 is a top view of an intermediate stage in the manufacture of theelectronic device in accordance with some embodiments of the presentdisclosure.

FIG. 32 is a cross-sectional view taken along the line XII-XIIillustrated in FIG. 31.

FIGS. 33 through 36 are cross-sectional views of intermediate stages inthe manufacture of the electronic device in accordance with someembodiments of the present disclosure.

DETAILED DESCRIPTION

Embodiments, or examples, of the disclosure illustrated in the drawingsare now described using specific language. It shall be understood thatno limitation of the scope of the disclosure is hereby intended. Anyalteration or modification of the described embodiments, and any furtherapplications of principles described in this document, are to beconsidered as normally occurring to one of ordinary skill in the art towhich the disclosure relates. Reference numerals may be repeatedthroughout the embodiments, but this does not necessarily mean thatfeature(s) of one embodiment apply to another embodiment, even if theyshare the same reference numeral.

It shall be understood that, although the terms first, second, third,etc. may be used herein to describe various elements, components,regions, layers or sections, these elements, components, regions, layersor sections are not limited by these terms. Rather, these terms aremerely used to distinguish one element, component, region, layer orsection from another element, component, region, layer or section. Thus,a first element, component, region, layer or section discussed belowcould be termed a second element, component, region, layer or sectionwithout departing from the teachings of the present inventive concept.

The terminology used herein is for the purpose of describing particularexample embodiments only and is not intended to be limited to thepresent inventive concept. As used herein, the singular forms “a,” “an”and “the” are intended to include the plural forms as well, unless thecontext clearly indicates otherwise. It shall be further understood thatthe terms “comprises” and “comprising,” when used in this specification,point out the presence of stated features, integers, steps, operations,elements, or components, but do not preclude the presence or addition ofone or more other features, integers, steps, operations, elements,components, or groups thereof.

FIG. 1 is a top view of an electronic device 10 in accordance with someembodiments of the present disclosure, FIG. 2 is a cross-sectional viewtaken along the line I-I illustrated in FIG. 1, and FIG. 3 is across-sectional view taken along the line II-II illustrated in FIG. 1.Referring to FIGS. 1 to 3, the electronic device 10 includes asemiconductor component 12, an insulating layer 14 disposed on thesemiconductor component 12, at least one contact plug 16 penetratingthrough the insulating layer 14, and a filtering component 18 disposedon the insulating layer 14 and the contact plug 16. In some embodiments,the filtering component 18 is electrically coupled to the semiconductorcomponent 12 through the contact plug 16.

In some embodiments, the filtering component 18 is used as a lowfrequency bypass filter. In some embodiments, the filtering component 18includes a bottom electrode 182 divided into a first segment 1822 and asecond segment 1824 separated from each other, an isolation layer 184disposed on the bottom electrode 182, a top electrode 186 extendingalong a top surface 1842 of the isolation layer 184 and disposed withinthe isolation layer 184, and a dielectric layer 188 between the bottomelectrode 182 and the top electrode 186.

In some embodiments, the first segment 1822 is connected to the contactplug 16. In some embodiments, a gap G is formed between the firstsegment 1822 and the second segment 1824. In some embodiments, the firstsegment 1822 is surrounded by the second segment 1824. In someembodiments, the isolation layer 184 is further disposed in the gap Gfor connecting the first segment 1822 to the second segment 1824. Insome embodiments, a lower surface 1822 of the bottom electrode 182 iscoplanar with a bottom surface 1844, opposite to the top surface 1842 ofthe isolation layer.

In some embodiments, the dielectric layer 188 extends along the topsurface 1842 of the isolation layer 184 and is disposed within theisolation layer 184 to encircle the top electrode 186. In someembodiments, the dielectric layer 188 is a conformal layer. In someembodiments, the dielectric layer 188 is sandwiched between the bottomelectrode 182 and the top electrode 186, such that when a power sourceis applied across the semiconductor component 12 and the filteringcomponent 18, the first segment 1822 of the bottom electrode 182 (havinga small footprint), the top electrode 186, and the dielectric layer 188collectively form at least one decoupling capacitor for noise mitigationin a high frequency application of the electronic device 10. In someembodiments, the second segment 1824 of the bottom electrode 182 (havinga large footprint), the top electrode 186, and the dielectric layer 188collectively form at least one dummy capacitor for preventing thedecoupling capacitor from collapse, wherein the collapse can occur dueto the second segment 1824 being disconnected from the contact plug 16and separated from the first segment 1822, such that power sourceapplied to the electronic device 10 cannot be conducted to the secondsegment 1824.

FIG. 4 is a flow diagram illustrating a method 300 for manufacturing anelectronic device 10 in accordance with some embodiments of the presentdisclosure. FIGS. 5 to 23 are schematic diagrams illustrating variousfabrication stages constructed according to the method 300 formanufacturing the electronic device 10 in accordance with someembodiments of the present disclosure. The stages shown in FIGS. 5 to 23are also illustrated schematically in the process flow in FIG. 4. In thefollowing discussion, the fabrication stages shown in FIGS. 5 to 23 arediscussed in reference to the process steps in FIG. 4.

Referring to FIG. 5, a semiconductor component 12, an insulating layer14, and at least one contact plug 16 are provided according to a step302 in FIG. 4. In some embodiments, the semiconductor component 12 maybe any functional component such as a digital device component formed byat least one semiconductor process in advance. In some embodiments, theinsulating layer 14 is formed on the semiconductor component 12 and thenplanarized, for example by a chemical mechanical polishing (CMP)process, to obtain a flat upper surface 142. In some embodiments, theinsulating layer 14 includes oxide. In some embodiments, the insulatinglayer 14 is made of silicon dioxide (SiO₂). In some embodiments, theinsulating layer 14 is formed, for example, using a chemical vapordeposition (CVD) process. In some embodiments, the insulating layer 14may be a spin-on glass (SOG) layer formed using a spin coating process.

In some embodiments, the contact plug 16 is disposed in the insulatinglayer 14. In some embodiments, the contact plug 16 is formed by stepsincluding (1) providing a photoresist layer (not shown) on theinsulating layer 14, (2) performing a photolithography process to definea pattern required to form a through-hole 144 in the insulating layer14, (3) performing an etching process on the insulating layer 14 toproduce the through-hole 144 by using the pattern in the photoresistlayer as a mask, wherein the semiconductor component 12 is exposed tothe through-hole 144, (4) depositing a conductive material into thethrough-hole 144, and (5) performing a planarizing process to remove theconductive material above the upper surface 142, such that a top surface162 of the contact plug 16 is coplanar with the upper surface 142. Inthe resulting structure, the contact plug 16 penetrates through theinsulating layer 14. In some embodiments, the contact plug 16 isphysically and electrically connected to the semiconductor component 12.In some embodiments, the contact plug 16 is made of conductive material,including copper, a copper alloy, tungsten, or polysilicon.

Referring again to FIG. 5, in some embodiments, a blanket bottomelectrode 181 is deposited on the insulating layer 14 and the contactplug 16 according to a step 304 in FIG. 4. In some embodiments, theblanket bottom electrode 181 is deposited, for example, using a CVDprocess. In some embodiments, the blanket bottom electrode 181 is madeof conductive material, including titanium, tungsten, or the like.

Next, a patterned mask 210 is provided on the blanket bottom electrode181 to pattern the blanket bottom electrode 181 according to a step 306in FIG. 4. In some embodiments, the patterned mask 210 has an opening212 to expose a portion of the blanket bottom electrode 181. In someembodiments, a patterning process and an etching process are performedto remove a portion of the blanket bottom electrode 181 through theopening 212. Accordingly, the first segment 1822 and the second segment1824 shown in FIGS. 6 and 7 are formed. In some embodiments, the firstsegment 1822 is separated from the second segment 1824 by a gap G. Insome embodiments, the patterned mask 210 on the remaining bottomelectrode 182 including the first segment 1822 and the second segment1824 is then removed by, for example, a wet etching process.

Referring to FIG. 8, in some embodiments, an isolation layer 184 isdeposited on the bottom electrode 182 according to a step 308 in FIG. 4.In some embodiments, the isolation layer 184 extends along the firstsegment 1822 and the second segment 1824 and is disposed within the gapG. In some embodiments, the isolation layer 184 includes a high kmaterial, hydrogen fluoride (HF), or zirconium oxide.

Referring to FIG. 9, in some embodiments, a first photoresist layer 220is coated on the isolation layer 184 according to a step 310 in FIG. 4.In some embodiments, the first photoresist layer 220 is a positivephotoresist layer. In some embodiments, a first mask 230 is furtherprovided over the first photoresist layer 220. In some embodiments, thefirst mask 230 has a plurality of optical transparent regions 232 and aplurality of optical opaque regions 234 corresponding to portions of thefirst photoresist layer 220 to be removed and to remain, respectively,in a subsequent etching process.

Next, a first photolithography process is performed to expose the firstphotoresist layer 220 to actinic radiation 240 through the first mask230 to provide a first photoresist pattern 222 according to a step 312in FIG. 4. Referring to FIGS. 10 and 11, in some embodiments, the firstphotoresist pattern 222 is made up of a plurality of first exposedportions 2222 and a plurality of first unexposed portions 2224. In someembodiments, the first exposed portions 2222 and the first unexposedportions 2224 are alternatingly arranged along the first direction x. Insome embodiments, the first mask 230 is then removed from the firstphotoresist pattern 222.

Referring to FIG. 12, in some embodiments, a second photoresist layer250 is coated on the first photoresist pattern 222 according to a step314 in FIG. 4. In some embodiments, the second photoresist layer 250 isa positive photoresist layer. In some embodiments, a second mask 260 isfurther provided over the second photoresist layer 250. In someembodiments, the second mask 260 has a plurality of optical transparentportions 262 and a plurality of optical opaque regions 264 correspondingto portions of the second photoresist layer 250 to be removed and toremain, respectively, in the subsequent etching process. In someembodiments, the optical opaque regions 264 are disposed over the gap Gto prevent the insulating layer 14 and the semiconductor component 12from being destroyed during the subsequent etching process.

Next, a second photolithography process is performed to expose thesecond photoresist layer 250 to actinic radiation 270 through the secondmask 260 to provide a second photoresist pattern 252 according to a step316 in FIG. 4. Referring to FIGS. 13 and 14, in some embodiments, thesecond photoresist pattern 252 is made up of a plurality of secondexposed portions 2522 and a plurality of second unexposed portions 2524.In some embodiments, the second exposed portions 2522 and the secondunexposed portions 2524 are alternatingly arranged along a seconddirection y perpendicular to the first direction x. In some embodiments,the second mask 260 is then removed from the second photoresist pattern252.

Referring to FIGS. 15 through 17, in some embodiments, an etchingprocess is performed to form a plurality of trenches 200 in theisolation layer 184 according to a step 318 in FIG. 4. In someembodiments, the etching process is used to remove the first exposedportions 2222, the second exposed portions 2522, and portions of theisolation layer 184 at intersections wherein the first exposed portions2222 and the second exposed portions 2522 intersect, such that thetrenches 200 are formed. In some embodiments, the etching process stopsat the bottom electrode 182. Referring to FIG. 18, in some embodiments,an ashing process or a wet strip process may be used to remove the firstunexposed portions 2224 and the second unexposed portions 2524.

Referring to FIG. 19, in some embodiments, a dielectric layer 188 isdeposited on the isolation layer 184 and in the trenches 200 accordingto a step 320 in FIG. 4. In some embodiments, the dielectric layer 188extends along a top surface 1842 of the isolation layer 184 and into thetrenches 200. In some embodiments, the dielectric layer 188 includesoxide. In some embodiments, the dielectric layer 188 may be formed usinga CVD process.

Referring to FIG. 20, a top electrode 186 is deposited on the dielectriclayer 188 according to a step 322 in FIG. 4. Accordingly, the electronicdevice 10 is completely formed. In some embodiments, the top electrode186 fully covers the dielectric layer 188. In some embodiments, the topelectrode 186 includes copper or a copper alloy, although other types ofconductive materials, including aluminum, silver, gold, tungsten, or acombination thereof, may also be used. In some embodiments, theformation methods of the top electrode 186 include a plating process(such as an electroplating process), a CVD process, a physical vapordeposition (PVD) process or a sputtering process.

FIG. 21 is a top view of an electronic device 10A in accordance withsome embodiments of the present disclosure, FIG. 22 is a cross-sectionalview taken along the line VIII-VIII illustrated in FIG. 21, and FIG. 23is a cross-sectional view taken along the line IX-IX illustrated in FIG.21. Referring to FIGS. 21 and 23, the electronic device 10A includes asemiconductor component 12, an insulating layer 14 disposed on thesemiconductor component 12, at least one contact plug 16 penetratingthrough the insulating layer 14, and a filtering component 18A disposedon the insulating layer 14 and the contact plug 16. In some embodiments,the filtering component 18A is electrically coupled to the semiconductorcomponent 12 through the contact plug 16.

In some embodiments, the filtering component 18A includes a blanketbottom electrode 181, an isolation layer 184 disposed on the blanketbottom electrode 181, a top electrode 186A, extending along a topsurface 1842 of the isolation layer 184 and disposed within theisolation layer 184, wherein the top electrode 186A is divided into afirst segment 1862 and a second segment 1864 separated from each other,and a dielectric layer 188 is disposed between the blanket bottomelectrode 181 and the top electrode 186A.

In some embodiments, the blanket bottom electrode 181 is connected tothe contact plug 16. In some embodiments, a gap G is formed between thefirst segment 1862 and the second segment 1864. In some embodiments, thefirst segment 1862 is surrounded by the second segment 1864. In someembodiments, the first segment 1862 has a footprint smaller than that ofthe second segment 1864.

In some embodiments, the dielectric layer 188 extends along the topsurface 1842 of the isolation layer 184 and into the isolation layer 184to encircle the top electrode 186. In some embodiments, the dielectriclayer 188 is a conformal layer. In some embodiments, the dielectriclayer 188 is sandwiched between the bottom electrode 182 and the topelectrode 186, such that when a power source V is applied across thesemiconductor component 12 and the filtering component 18, the blanketbottom electrode 181, the first segment 1862 of the top electrode 186,and the dielectric layer 188 collectively form at least one decouplingcapacitor for noise mitigation in a high frequency application of theelectronic device 10A. In some embodiments, the bottom electrode 182,the second segment 1864 of the top electrode 186, and the dielectriclayer 188 collectively form at least one dummy capacitor for preventingthe decoupling capacitor from collapse due to the power source V notbeing applied to the second segment 1824.

FIG. 24 is a flow diagram illustrating a method 400 for manufacturing anelectronic device 10A in accordance with some embodiments of the presentdisclosure. FIGS. 25 to 36 are schematic diagrams illustrating variousfabrication stages constructed according to the method 400 formanufacturing the electronic device 10 in accordance with someembodiments of the present disclosure. The stages shown in FIGS. 25 to36 are also illustrated schematically in the process flow in FIG. 24. Inthe following discussion, the fabrication stages shown in FIGS. 25 to 36are discussed in reference to the process steps in FIG. 24.

Referring to FIG. 25, a semiconductor component 12, an insulating layer14, and at least one contact plug 16 are provided according to a step402 in FIG. 24. In some embodiments, the insulating layer 14 with a flatupper surface 142 is formed on the semiconductor component 12, and thecontact plug 16 is disposed penetrating through the insulating layer 14.

Next, a blanket bottom electrode 181 is deposited on the insulatinglayer 14 and the contact plug 16 according to a step 404 in FIG. 24. Insome embodiments, the blanket bottom electrode 181 is connected to thecontact plug 16. In some embodiments, the blanket bottom electrode 181is deposited, for example, using a CVD process. In some embodiments, anisolation layer 184 is then deposited on the blanket bottom electrode181 according to a step 408 in FIG. 24. In some embodiments, theisolation layer 184 includes a high k material, hydrogen fluoride, orzirconium oxide.

Referring again to FIG. 25, in some embodiments, a first photoresistlayer 220 is then coated on the isolation layer 184 according to a step410 in FIG. 24. In some embodiments, the first photoresist layer 220 isa positive photoresist layer. In some embodiments, a first mask 230 isfurther provided over the first photoresist layer 220. In someembodiments, the first mask 230 has a plurality of optical transparentregions 232 and a plurality of optical opaque regions 234 correspondingto portions of the first photoresist layer 220 to be removed and toremain, respectively, in a subsequent etching process. Next, a firstphotolithography process is performed to expose the first photoresistlayer 220 to actinic radiation 240 through the first mask 230 accordingto a step 412 in FIG. 24. Accordingly, a first photoresist pattern 222made up of a plurality of first exposed portions 2222 and a plurality offirst unexposed portions 2224 are formed, as shown FIGS. 26 and 27. Insome embodiments, the first exposed portions 2222 and the firstunexposed portions 2224 are alternatingly arranged along a firstdirection x. In some embodiments, the first mask 230 is then removedfrom the first photoresist pattern 222.

Referring to FIG. 28, in some embodiments, a second photoresist layer250 is coated on the first photoresist pattern 222 according to a step414 in FIG. 24. In some embodiments, the second photoresist layer 250 isa positive photoresist layer. In some embodiments, a second mask 260 isfurther provided over the second photoresist layer 250. In someembodiments, the second mask 260 has a plurality of optical transparentportions 262 and a plurality of optical opaque regions 264 correspondingto portions of the second photoresist layer 250 to be removed and toremain, respectively, in the subsequent etching process.

Next, a second photolithography process is performed to expose thesecond photoresist layer 250 to actinic radiation 270 through the secondmask 260 according to a step 416 in FIG. 24. Accordingly, a secondphotoresist pattern 252 made up of a plurality of second exposedportions 2522 and a plurality of second unexposed portions 2524 areformed, as shown in FIGS. 29 and 30. In some embodiments, the secondexposed portions 2522 and the second unexposed portions 2524 arealternatingly arranged along a second direction y perpendicular to thefirst direction x. In some embodiments, the second mask 260 is thenremoved from the second photoresist pattern 262.

Referring to FIGS. 31 through 32, in some embodiments, an etchingprocess is performed to form a plurality of trenches 200 according to astep 418 in FIG. 24. In some embodiments, the etching process is used toremove the first exposed portions 2222, the second exposed portions2522, and portions of the isolation layer 184 at intersections whereinthe first exposed portions 2222 and the second exposed portions 2522intersect, such that the trenches 200 are formed. In some embodiments,the etching process stops at the blanket bottom electrode 181. Referringto FIG. 33, in some embodiments, an ashing process or a wet stripprocess may be used to remove the first unexposed portions 2224 and thesecond unexposed portions 2524.

Referring to FIG. 34, in some embodiments, a dielectric layer 188 isdeposited on the isolation layer 184 and in the trenches 200 accordingto a step 420 in FIG. 24. In some embodiments, the dielectric layer 188conformally extends along a top surface 1842 of the isolation layer 184and into the trenches 200. In some embodiments, the dielectric layerincludes oxide. In some embodiments, the dielectric layer 188 may beformed, for example, using a CVD process.

Referring to FIG. 35, a top electrode 186 is deposited on the dielectriclayer 188 according to a step 422 in FIG. 24. In some embodiments, thetop electrode 186 fully covers the dielectric layer 188. In someembodiments, the top electrode 186 includes copper or a copper alloy. Insome embodiments, the formation methods of the top electrode 186 includea plating process, a CVD process, a PVD process or a sputtering process.

Next, a patterned mask 280 is provided on the top electrode 186 topattern the top electrode 186 according to a step 424 in FIG. 24.Accordingly, the electronic device 10A, shown in FIGS. 21 through 23, iscompletely formed. Referring to FIG. 36, in some embodiments, thepatterned mask 280 has an opening 282 to expose a portion of the topelectrode 186. In some embodiments, an etching process is performed toremove a portion of the top electrode 186. Accordingly, a first segment1862 and a second segment 1864, as shown in FIGS. 21 through 23, areformed. In some embodiments, the first segment 1862 is separated fromthe second segment 1864 by a gap G. In some embodiments, the patternedmask 280 on the remaining top electrode 186A including the first segment1862 and the second segment 1864 is then removed by, for example, a wetetching process.

In conclusion, with the configuration of electronic device 10/10A, thefiltering components 18/18A include at least one decoupling capacitorfunctioning as a noise filter and at least one dummy capacitorfunctioning as a reinforced structure to prevent the decouplingcapacitor from collapse. Thus, noise can be effectively reduced andoperation speed of the electronic device 10/10A can be improved.

One aspect of the present disclosure provides an electronic device. Theelectronic device includes a semiconductor component, an insulatinglayer, at least one contact plug, and a filtering component. Theinsulating layer is disposed on the semiconductor component. The contactplug penetrates through the insulating layer. The filtering component isdisposed on the insulating layer and the contact plug. The filteringcomponent includes a bottom electrode, an isolation layer, a topelectrode, and a dielectric layer. The bottom electrode is divided intoa first segment connected to the contact plug and a second segmentseparated from the first segment. The isolation layer is disposed on thebottom electrode, the top electrode is disposed in the isolation layer,and the dielectric layer is disposed between the bottom electrode andthe top electrode.

One aspect of the present disclosure provides an electronic device. Theelectronic device includes a semiconductor component, an insulatinglayer, at least one contact plug, and a filtering component. Theinsulating layer is disposed on the semiconductor component. The contactplug penetrates through the insulating layer. The filtering component isdisposed on the insulating layer and the contact plug. The filteringcomponent includes a blanket bottom electrode, an isolation layer, adielectric layer, and a top electrode. The blanket bottom electrode isdisposed on the insulating layer and the contact plug, and the blanketbottom electrode is connected to the contact plug. The isolation layeris disposed on the blanket bottom electrode. The dielectric layerextends along a top surface of the isolation layer and into theisolation layer. The top electrode is disposed on the dielectric layer,and the top electrode comprises a first segment and a second segmentseparated from each other.

One aspect of the present disclosure provides a method of manufacturingan electronic device. The method includes steps of providing a blanketbottom electrode; patterning the blanket bottom electrode to form afirst segment and a second segment separated from each other; depositingan isolation layer on the first segment, on the second segment, and overa gap between the first segment and the second segment; providing afirst photoresist layer on the isolation layer; exposing the firstphotoresist layer to form a first photoresist pattern having a pluralityof first exposed portions and a plurality of first unexposed portions;providing a second photoresist layer on the first photoresist pattern;exposing the second photoresist layer to form a second photoresistpattern having a plurality of second exposed portions and a plurality ofsecond unexposed portions; performing an etching process to form aplurality of trenches at intersections wherein the first exposedportions and the second exposed portions intersect; depositing adielectric layer on the isolation layer and in the trenches; anddepositing a top electrode on the dielectric layer.

One aspect of the present disclosure provides a method of manufacturingan electronic device. The method includes steps of providing a blanketbottom electrode; depositing an isolation layer on the blanket bottomelectrode; coating a first photoresist layer on the isolation layer;exposing the first photoresist layer to form a first photoresist patternhaving a plurality of first exposed portions and a plurality of firstunexposed portions; coating a second photoresist layer on the firstphotoresist pattern; exposing the second photoresist layer to form asecond photoresist pattern having a plurality of second exposed portionsand a plurality of second unexposed portions; performing an etchingprocess to form a plurality of trenches at intersections wherein thefirst exposed portions and the second exposed portions intersect;depositing a dielectric layer on the isolation layer and in thetrenches; depositing a top electrode on the dielectric layer; andpatterning the top electrode to form a first segment and a secondsegment separated from each other.

Although the present disclosure and its advantages have been describedin detail, it should be understood that various changes, substitutionsand alterations can be made herein without departing from the spirit andscope of the disclosure as defined by the appended claims. For example,many of the processes discussed above can be implemented in differentmethodologies and replaced by other processes, or a combination thereof.

Moreover, the scope of the present application is not intended to belimited to the particular embodiments of the process, machine,manufacture, and composition of matter, means, methods and stepsdescribed in the specification. As one of ordinary skill in the art willreadily appreciate from the present disclosure, processes, machines,manufacture, compositions of matter, means, methods, or steps, presentlyexisting or later to be developed, that perform substantially the samefunction or achieve substantially the same result as the correspondingembodiments described herein may be utilized according to the presentdisclosure. Accordingly, the appended claims are intended to includewithin their scope such processes, machines, manufacture, compositionsof matter, means, methods, or steps.

What is claimed is:
 1. A method of manufacturing an electronic device,comprising: providing a blanket bottom electrode; patterning the blanketbottom electrode to form a first segment and a second segment separatedfrom each other; depositing an isolation layer on the first segment, onthe second segment, and over a gap between the first segment and thesecond segment; providing a first photoresist layer on the isolationlayer; exposing the first photoresist layer to form a first photoresistpattern having a plurality of first exposed portions and a plurality offirst unexposed portions; providing a second photoresist layer on thefirst photoresist pattern; exposing the second photoresist layer to forma second photoresist pattern having a plurality of second exposedportions and a plurality of second unexposed portions; performing anetching process to form a plurality of trenches at intersections whereinthe first exposed portions and the second exposed portions intersect;depositing a dielectric layer on the isolation layer and in thetrenches; and depositing a top electrode on the dielectric layer.
 2. Themethod of claim 1, wherein the second unexposed portions are disposedover the gap.
 3. The method of claim 1, wherein the first exposedportions and the first unexposed portions are alternatingly arrangedalong a first direction, and the second exposed portions and the secondunexposed portions are alternatingly arranged along a second directionperpendicular to the first direction.
 4. The method of claim 1, furthercomprising removing the first unexposed portions and the secondunexposed portions before the deposition of the dielectric layer.
 5. Themethod of claim 1, wherein the dielectric layer is a conformal layer. 6.The method of claim 1, further comprising: providing semiconductorcomponent; depositing an insulating layer on the semiconductorcomponent; and forming at least one contact plug in the insulating layerbefore the providing of the blanket bottom electrode.
 7. The method ofclaim 6, wherein the first segment is in contact with the contact plug.8. A method of manufacturing an electronic device, comprising: providinga blanket bottom electrode; depositing an isolation layer on the blanketbottom electrode; coating a first photoresist layer on the isolationlayer; exposing the first photoresist layer to form a first photoresistpattern having a plurality of first exposed portions and a plurality offirst unexposed portions; coating a second photoresist layer on thefirst photoresist pattern; exposing the second photoresist layer to forma second photoresist pattern having a plurality of second exposedportions and a plurality of second unexposed portions; performing anetching process to form a plurality of trenches at intersections whereinthe first exposed portions and the second exposed portions intersect;depositing a dielectric layer on the isolation layer and in thetrenches; depositing a top electrode on the dielectric layer; andpatterning the top electrode to form a first segment and a secondsegment separated from each other.
 9. The method of claim 8, wherein thefirst exposed portions and the first unexposed portions arealternatingly arranged along a first direction, and the second exposedportions and the second unexposed portions are alternatingly arrangedalong a second direction perpendicular to the first direction.
 10. Themethod of claim 8, further comprising removing the first unexposedportions and the second unexposed portions before the deposition of thedielectric layer.
 11. The method of claim 8, wherein the dielectriclayer is a conformal layer.
 12. The method of claim 8, furthercomprising: providing semiconductor component; depositing an insulatinglayer on the semiconductor component; and forming at least one contactplug in the insulating layer before the providing of the blanket bottomelectrode.